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HIGH PURITY WATER SYSTEMS

Today's increasingly sophisticated processing technologies demand the same level of sophistication in designing and building equipment for treatment of water. Requirements can be as simple as a water softener, filter or a chemical additive device or as complex as an ultrapure water (UPW) system serving the semiconductor, electronics and pharmaceutical manufacturing processes. PACT 's engineering staff will recommend, design and build the equipment required to produce the water purities demanded by said industries.

The objectives of A UPW system design is to remove suspended solids (particulates), dissolved solids (salts), organic compounds (TOC), Bacteria, spores and mold and to minimize introduction of contaminants from materials of construction.


High Purity water, typically demanded in the SEMICONDUCTOR industry:

Resistivity

>18.2 megohm/cm

TOC

<5.0 ppb

Total Bacteria

<2/100 ml

Dissolved Silica (SiO2 )

<0.5 ppb

Aluminum (Al)

<0.1 ppb

Ammonia (NH 4 )

<0.05 ppb

Chromium (Cr)

<0.05 ppb

Iron (Fe)

<0.1 ppb

Manganese (Mn)

<0.1 ppb

Potassium (K)

<0.05 ppb

Sodium (Na)

<0.05 ppb

Bromide (Br)

<0.05 ppb

Chloride (Cl)

<0.05 ppb

Nitrate (NO 3 )

<0.05 ppb

Phosphate (PO4 )

<0.1 ppb

Sulfate (SO 4 )

<0.1 ppb

Total Dissolved Solids

5 ppb


A UPW system utilizes a range of equipment designed, manufactured and/or supplied by PACT and that can be summarized as follows:

   Pressure Sand & Multimedia Filters

   Activated Carbon Filters

   Ion-Exchange Softeners

   Two-Bed Deionizers

   Mixed-Bed Deionizers

   Reverse Osmosis Systems

   Vacuum Degasifers

   Electro-Deionization units

   Microfiltration

   Ultraviolet Disinfection

   Ozonation

  Chemical Metering Packages

   Instrumentation & Control

  Special Piping, Fittings and Linings